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Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent
Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent

Koch TARGAII10048-35-PEC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent

In semiconductor fabrication, water purity is non-negotiable. Even trace contaminants—particles, bacteria, or dissolved organics—can cause defects in microchips, leading to yield loss and costly rework. Ultrafiltration (UF) membranes serve as a first line of defense in ultra-pure water (UPW) systems, ensuring that water meets the SEMI F63 and ASTM D5127 purity standards required for wafer processing.

Introduction

In semiconductor fabrication, water purity is non-negotiable. Even trace contaminants—particles, bacteria, or dissolved organics—can cause defects in microchips, leading to yield loss and costly rework. Ultrafiltration (UF) membranes serve as a first line of defense in ultra-pure water (UPW) systems, ensuring that water meets the SEMI F63 and ASTM D5127 purity standards required for wafer processing.

As a vertically integrated manufacturer of ultrafiltration membranes, we specialize in producing high-efficiency, durable UF modules tailored for semiconductor applications. Our in-house production capabilities allow us to deliver superior quality at competitive prices with industry-leading lead times—giving semiconductor fabs a reliable alternative to expensive imported solutions.


Key Challenges in Semiconductor Water Purification & How UF Membranes Help

Semiconductor UPW systems demand near-absolute removal of impurities, which requires multi-stage filtration. Ultrafiltration plays a pivotal role by:

1. Eliminating Submicron Particles & Colloids

Problem: Particles as small as 0.1 µm can adhere to silicon wafers, causing defects during photolithography and etching.

Solution: Our UF membranes feature precisely controlled pore sizes (0.01–0.1 µm), effectively removing silica, nanoparticles, and colloidal matter before water reaches RO or DI stages.

2. Preventing Biofouling & Endotoxin Contamination

Problem: Bacteria and endotoxins can form biofilms, clogging downstream systems and increasing maintenance costs.

Solution: UF acts as a microbiological barrier, reducing bacterial counts by >99.9% and minimizing endotoxin levels to <0.25 EU/mL.

3. Extending the Lifespan of RO & DI Systems

Problem: Without proper pretreatment, RO membranes and ion exchange resins foul quickly, increasing replacement frequency.

Solution: UF pretreatment replaces traditional multimedia filters, offering higher consistency and lower pressure drop, thus optimizing RO/DI performance.

ultrafiltration membranes (5)


Why Choose Our Ultrafiltration Membranes?

1. Engineered for High Purity & Reliability

Our membranes are manufactured using PVDF (Polyvinylidene Fluoride) or PES (Polyethersulfone), selected for:

Exceptional chemical resistance – Withstands frequent CIP (Clean-in-Place) cycles with acids (HCl) and alkalis (NaOH).

Low fouling properties – Hydrophilic surface modification reduces organic adhesion, maintaining stable flux rates.

High tensile strength – Reinforced fibers resist breakage, even under aggressive backwash conditions.

2. Cost Efficiency Without Compromise

Many semiconductor suppliers rely on high-cost imported UF membranes, but our direct factory production allows us to offer:

30–50% lower costs compared to Western or Japanese brands.

Same or better performance in terms of rejection rates and durability.

Bulk order discounts for large-scale UPW projects.

3. Rapid Turnaround & Customization

Semiconductor fabs often face tight project timelines. Unlike suppliers with long procurement cycles, we offer:

Standard UF modules shipped in 7–10 days.

Custom configurations (e.g., different housing materials, connectors, or pore sizes) in 2–3 weeks.

On-site technical support for integration into existing UPW systems.

4. Tailored Solutions for Semiconductor Applications

We collaborate with UPW system integrators to design application-specific UF solutions, including:

High-flow modules for large-scale UPW plants.

Compact, skid-mounted systems for space-constrained fabs.

Automation-ready designs compatible with PLC-controlled backwash systems.

Ultrafiltration Membrane for Electronic Grade Ultrapure Water Koch TARGAII10048-35-PEC (1)


Real-World Application: UF Membranes in a Leading Fab’s UPW System

A major semiconductor manufacturer in Asia replaced its aging filtration system with our PES-based UF membranes, achieving:

1. 40% longer RO membrane lifespan due to improved pretreatment.

2. UPW quality exceeding SEMI F63 standards (TOC < 0.5 ppb, particle counts undetectable at 0.05 µm).

3. 30% reduction in maintenance costs from fewer CIP cycles and backwash events.


Conclusion: A Smarter Choice for Semiconductor UPW Systems

For semiconductor manufacturers seeking high-performance, cost-efficient ultrafiltration, our membranes provide unmatched value—combining rigorous quality control, fast production, and competitive pricing. By integrating our UF solutions, fabs can enhance UPW purity, reduce operational costs, and minimize downtime.

Contact us today to discuss how our ultrafiltration technology can optimize your semiconductor water treatment process!


Q&A

Q: How to detect membrane damage?

A: Conduct regular integrity tests like bubble point testing.


Q: Can UF remove iron bacteria?

A: Yes, physically removes the bacteria but not dissolved iron.


Q: What's the typical membrane thickness?

A: 100-300 microns for the active separation layer.


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