K-600ETN0812 Ultrafiltration Membrane for Electronic Grade Ultrapure Water Hyflux Equivalent

Product Introduction

LEFILTER proudly presents the K-600ETN0812 Ultrafiltration Membrane, a premium-grade solution tailored for high-purity water systems within the electronics and semiconductor sectors. Engineered as a direct equivalent to Hyflux's benchmark models, this membrane stands out for its precise pore structure and consistent separation performance, making it highly suited for ultrapure water (UPW) production. Its ability to reliably eliminate fine colloids, microorganisms, and particles while maintaining high water recovery rates positions it as an indispensable element in cutting-edge purification processes where quality control is critical.

Technical Specifications

• Model: K-600ETN0812

• Membrane Material: Polyethersulfone (PES)

• Membrane Type: Hollow fiber

• Pore Size: 0.01 μm nominal

• Effective Membrane Area: 50 m²

• Outer Diameter: 1.3 mm

• Operating Pressure: 0.1 – 0.3 MPa

• Max Inlet Pressure: 0.4 MPa

• Operating pH Range: 3 – 10 (cleaning pH range: 2 – 11)

• Operating Temperature: 5°C – 45°C

• Design Flux Rate: 50–120 L/m²·h (dependent on feed water conditions)

• Backwash Frequency: Recommended every 30–60 minutes

• End Cap Type: Double O-ring sealing

• Connections: Customized per system requirements

Application Scope

The K-600ETN0812 Ultrafiltration Membrane is specifically optimized for electronic-grade ultrapure water systems, where even submicron impurities can cause significant defects in delicate manufacturing environments. Its main areas of application include:

• Semiconductor fabrication: Ensures particle-free water for wafer rinsing and photoresist processes.

• TFT-LCD production: Supplies ultrapure rinse water with tight microbial control for display panel assembly lines.

• Precision optics manufacturing: Delivers high-clarity water for lens coating and cleaning stages.

• Hard disk production: Reduces potential contamination in magnetic storage component assembly.

• Solar cell and photovoltaic module processing: Supports high-throughput lines requiring consistently clean water for etching, doping, and cleaning.

In addition, it is ideal for UPW pre-treatment before reverse osmosis or mixed bed polishing, improving downstream system longevity and performance.

FAQ

Q1: Is the K-600ETN0812 compatible with existing Hyflux systems?

A1: Yes, this model is fully compatible with systems designed for Hyflux equivalents, offering similar physical dimensions and flow characteristics for plug-and-play replacement.

Q2: How often should the membrane be chemically cleaned?

A2: Frequency depends on feed water quality, but for electronic applications, we recommend performing chemical cleaning every 1–2 weeks or whenever transmembrane pressure increases significantly.