LEFILTER is pleased to unveil the K-600B0820 Ultrafiltration Membrane for Electronic Grade Ultrapure Water, a precision-engineered membrane module developed as a high-performance replacement for Hyflux ultrafiltration units. Designed with advanced PVDF hollow fiber technology, this membrane ensures reliable removal of suspended solids, bacteria, colloids, and organic contaminants, all while preserving the stability and consistency of ultrapure water (UPW) systems. Whether for semiconductor fabrication, flat panel manufacturing, or precision component cleaning, the K-600B0820 is an ideal solution for industries that demand the highest standards of water purity.
Technical Specifications
The K-600B0820 module features an outside-in hollow fiber configuration and offers an optimal balance between filtration performance, mechanical strength, and chemical resistance. The module is housed in a durable casing and supports high recovery rates with minimal pressure loss, making it a robust and long-lasting solution in UPW environments.
Parameter | Specification |
---|
Model | K-600B0820 |
Membrane Material | PVDF (Polyvinylidene Fluoride) |
Configuration | Hollow Fiber, Outside-In Flow |
Nominal Pore Size | 0.03 μm |
Molecular Weight Cut-Off (MWCO) | ~50,000 Daltons |
Membrane Surface Area | 6.0–6.5 m² (approximate) |
Operating Pressure Range | 0.1 – 0.4 MPa |
Maximum Operating Temperature | 45°C |
pH Range for Operation | 3 – 10 (cleaning up to pH 11) |
Recovery Rate | 90 – 98% |
Backwash Capability | Yes (air and/or water) |
Housing Material | PVC or optional FRP/stainless steel casing |

This membrane module is engineered to seamlessly replace Hyflux equivalents in electronic-grade water systems, with no compromise in structural or functional integrity.
Application Scenarios
As a high-precision Ultrafiltration Membrane for Electronic Grade Ultrapure Water, the K-600B0820 plays an indispensable role in production lines and water treatment systems where absolute water cleanliness is required. It is especially suited for:
Semiconductor manufacturing – providing ultra-low TOC and SDI water during wafer cleaning, CMP, and lithography stages.
Display technology production – safeguarding LCD, OLED, and micro-LED panels from micro-particle damage during rinsing.
Solar photovoltaic panel fabrication – ensuring rinse water purity in silicon wafer and cell production.
UPW post-treatment systems – acting as the final filtration stage after RO and ion exchange to eliminate biological and particulate contaminants.
Precision glass, sensor, and lens manufacturing – maintaining spotless component surfaces to avoid rejection or defects.
Cleanroom water supply and humidification – ensuring that water used in environmental control systems remains free from microbial or particulate intrusion.
Thanks to its broad compatibility, the K-600B0820 is ideal for both new installations and membrane replacements in existing systems originally outfitted with Hyflux modules.
FAQ
Q1: Can the K-600B0820 directly replace Hyflux ultrafiltration membranes?
A1: Yes. The K-600B0820 is designed to match Hyflux’s key dimensions and operational parameters, making it a direct replacement in most systems without modification.
Q2: What kind of cleaning protocol is recommended for this membrane?
A2: Regular backwashing and periodic chemical cleaning (CIP) using pH-adjusted acidic or alkaline agents help maintain optimal performance. Cleaning frequency depends on feedwater quality and system usage.