LEFILTER proudly introduces the HFU-2020AN Ultrafiltration Membrane for Electronic Grade Ultrapure Water, an advanced filtration solution tailored to the rigorous quality demands of the semiconductor, precision manufacturing, and high-tech electronics industries. Designed as a high-efficiency replacement for the Toray UF membrane series, this model integrates state-of-the-art hollow fiber membrane technology with enhanced performance parameters, ensuring exceptional water purity essential for sensitive production environments. Whether applied in new system designs or as a retrofit solution, the HFU-2020AN delivers stable, long-term ultrafiltration performance with minimal maintenance.
Product Specifications
Engineered with precision, the HFU-2020AN employs a robust PVDF membrane structure housed within a corrosion-resistant module casing. Its outside-in flow design maximizes surface area utilization, while maintaining low pressure loss and high particulate retention efficiency.
Technical Parameter | Details |
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Model | HFU-2020AN |
Membrane Material | PVDF (Polyvinylidene Fluoride) |
Fiber Configuration | Hollow Fiber, Outside-In Flow |
Nominal Pore Size | 0.03 μm |
Molecular Weight Cut-Off (MWCO) | Approximately 50,000 Daltons |
Effective Membrane Area | 12.0 m² (approximate) |
Operating Pressure Range | 0.1 – 0.4 MPa |
Maximum Operating Temperature | 45°C |
Recommended pH Range (operation) | 3 – 10 (cleaning up to pH 11) |
Recovery Efficiency | 92% – 98% |
Compatible Installation | Vertical or Horizontal |
Membrane Housing | PVC, CPVC, or stainless steel (optional) |

The HFU-2020AN's design prioritizes operational stability, high throughput, and long service life, making it a reliable component in ultrapure water production systems.
Application Areas
Serving as a premium Ultrafiltration Membrane for Electronic Grade Ultrapure Water, the HFU-2020AN plays a critical role in maintaining sub-micron purity levels required by high-precision industries. Its performance advantages make it suitable for a wide range of applications including:
Semiconductor device manufacturing – providing impurity-free rinse water during critical wafer cleaning and etching processes.
Flat panel display fabrication – preventing surface contamination during production of TFT, OLED, and LCD screens.
Photovoltaic module assembly – ensuring particle-free rinsing in solar cell line processes to improve cell yield.
Final-stage polishing in UPW systems – used after reverse osmosis and deionization to eliminate remaining particulates and biological contaminants.
Microelectronics assembly and testing labs – where ultraclean water is essential for avoiding circuit defects and maintaining QA standards.
Industrial ultrapure humidification systems – maintaining indoor air quality in cleanrooms through microbe-free steam.
Whether upgrading existing Toray systems or building new high-performance water purification lines, the HFU-2020AN ensures compatibility, performance consistency, and cost-efficiency.
FAQ
Q1: What sets the HFU-2020AN apart from the HFU-1020AN model?
A1: The HFU-2020AN features a larger membrane area (12.0 m² vs. 6.0 m²), providing higher filtration capacity, making it better suited for large-scale ultrapure water systems requiring greater throughput.
Q2: Is the HFU-2020AN suitable for long-term use under continuous operation?
A2: Yes. Its durable PVDF membrane material and optimized flow structure are designed for stable, continuous operation in demanding environments, with typical service life exceeding 2 years under proper maintenance.