LEFILTER is proud to present the HFU-1020AN Ultrafiltration Membrane for Electronic Grade Ultrapure Water, an advanced filtration module engineered to match the performance and compatibility of the Toray ultrafiltration membrane series. Designed to deliver consistently high water purity, the HFU-1020AN integrates next-generation hollow fiber membrane technology with robust system adaptability, making it an ideal solution for ultrapure water (UPW) systems serving critical industries such as semiconductors, flat-panel displays, and microelectronics. Its high efficiency in removing fine particulates, bacteria, and organics ensures seamless integration into cleanroom-level water systems.
Technical Specifications
Manufactured using high-grade PVDF hollow fibers and configured for outside-in flow, the HFU-1020AN is designed to operate reliably in high-purity environments. It offers stable flux, minimal fouling tendencies, and chemical resistance across a wide operational range.
Parameter | Specification |
---|
Product Model | HFU-1020AN |
Membrane Material | PVDF (Polyvinylidene Fluoride) |
Fiber Type | Hollow Fiber, Outside-In Flow |
Nominal Pore Size | 0.03 μm |
Molecular Weight Cut-Off (MWCO) | ~50,000 Daltons |
Effective Membrane Area | 6.0 m² (typical) |
Housing Material | Optional PVC or stainless steel |
Operating Pressure Range | 0.1 – 0.4 MPa |
Maximum Operating Temperature | 45°C |
Recommended pH Range | 3 – 10 (cleaning up to pH 11) |
Recovery Rate | 92–98% |
Backwash Capability | Supported (Air/Water) |
Flow Configuration | Vertical or horizontal installation |

The membrane module is optimized for both new installations and retrofits in systems originally designed for Toray UF models, offering smooth transition without system redesign.
Application Scenarios
As a high-performance Ultrafiltration Membrane for Electronic Grade Ultrapure Water, the HFU-1020AN is deployed in a wide range of ultrapure water production systems where even trace contamination can jeopardize process stability and product integrity. Its primary applications include:
Semiconductor manufacturing fabs – particularly in post-chemical cleaning and wafer rinsing processes where ultrapure water is essential.
Photovoltaic cell production lines – supporting clean rinsing during silicon wafer and module fabrication.
TFT-LCD and OLED display plants – ensuring pristine water is used during surface treatment and patterning steps.
Final polishing steps in UPW treatment trains – following RO and mixed-bed DI units for enhanced microbial and particulate control.
Precision component and micro-lens production – where ultra-low levels of turbidity and TOC are mission-critical.
Cleanroom environmental controls – as a safeguard in high-purity humidification systems.
Its consistent output, strong chemical resilience, and high compatibility with industry-standard setups make it a dependable choice for critical water treatment processes.
FAQ
Q1: Is the HFU-1020AN compatible with existing Toray UF membrane systems?
A1: Yes. The HFU-1020AN is dimensionally and functionally designed as a direct equivalent to Toray's standard UF modules, making integration seamless.
Q2: How often should the HFU-1020AN membrane be cleaned?
A2: Cleaning intervals vary by application and feedwater quality. In well-managed UPW systems, membranes typically require chemical cleaning every 4–6 months.