LEFILTER is pleased to introduce the SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water, a high-efficiency filtration module engineered to meet the stringent purity requirements of the electronics, semiconductor, and precision optics industries. Designed as a functional equivalent to the Pentair ultrafiltration series, the SXL-225FSFCPVC membrane combines chemically resistant materials with advanced hollow fiber construction, delivering outstanding contaminant removal performance for ultrapure water (UPW) systems across a wide range of high-tech manufacturing environments.
Technical Specifications
Crafted for demanding applications, the SXL-225FSFCPVC incorporates fine-pored PVDF hollow fibers encased in a durable CPVC housing. Its outside-in flow path ensures superior retention of particulates and microorganisms while maintaining a stable flow rate under low pressure conditions.
Parameter | Specification |
---|
Model | SXL-225FSFCPVC |
Membrane Material | PVDF (Polyvinylidene Fluoride) |
Housing Material | CPVC (Chlorinated Polyvinyl Chloride) |
Membrane Type | Hollow Fiber, Outside-In Flow |
Nominal Pore Size | 0.03 μm |
Molecular Weight Cut-Off (MWCO) | ~50,000 Daltons |
Effective Membrane Area | 6.0 m² (approximate) |
Operating Pressure Range | 0.1 – 0.4 MPa |
Operating Temperature Range | 5 – 45°C |
pH Range (Operation) | 3 – 10 (cleaning up to pH 11) |
Typical Recovery Rate | 90–98% |
Recommended Cleaning Method | CIP (Chemical Cleaning in Place) |
Flow Configuration | Vertical or horizontal installation |

This design ensures compatibility with a broad spectrum of system configurations and guarantees reliable performance in long-term operations.
Key Applications
As a Ultrafiltration Membrane for Electronic Grade Ultrapure Water, the SXL-225FSFCPVC is tailored for use in high-purity water systems where any trace of contamination could compromise production integrity. It is particularly well-suited for the following critical applications:
Semiconductor wafer processing – ensuring rinse and etch stages are supplied with contaminant-free water.
TFT-LCD and OLED panel manufacturing – protecting display surfaces from micro-defects due to suspended solids or microorganisms.
Solar panel fabrication – contributing to optimal cell efficiency through ultrapure water rinses.
Final-stage UPW polishing – deployed after reverse osmosis and ion exchange units to ensure sub-micron water quality.
Microelectronic component assembly – where even nanometer-scale particles can cause defects or yield loss.
Cleanroom humidification systems – where microbial control is critical to maintaining air purity standards.
Thanks to its high compatibility and rugged housing design, the SXL-225FSFCPVC is a smart replacement solution for Pentair membrane users looking to maintain quality while optimizing cost-effectiveness.
FAQ
Q1: Is the SXL-225FSFCPVC membrane compatible with Pentair UF systems without modification?
A1: Yes, this membrane is specifically designed to be a drop-in equivalent to Pentair UF models and can be integrated into most existing setups without structural changes.
Q2: How often does this membrane require chemical cleaning?
A2:Cleaning frequency depends on the feedwater quality and system operation. In most UPW systems with pre-treatment, a chemical cleaning interval of every 3–6 months is typical to maintain optimal performance.