LEFILTER proudly introduces the UNA-620A Ultrafiltration Membrane for Electronic Grade Ultrapure Water, an advanced filtration solution meticulously designed to meet the stringent purity standards of the semiconductor and electronics manufacturing industries. Developed as an equivalent to the renowned Asahi Kasei Microza membrane, the UNA-620A integrates superior membrane technology and precise pore structure to ensure the efficient removal of colloids, bacteria, endotoxins, and fine particulates, all while preserving critical water chemistry essential for ultra-clean processes.
Technical Specifications
The UNA-620A Ultrafiltration Membrane is fabricated using high-performance hollow fiber PVDF (Polyvinylidene Fluoride), chosen for its chemical resistance, thermal stability, and robust mechanical strength, making it highly durable even in challenging ultrapure water systems.
Parameter | Value |
---|
Model | UNA-620A |
Membrane Material | PVDF (Polyvinylidene Fluoride) |
Configuration | Outside-in hollow fiber |
Molecular Weight Cut-Off (MWCO) | Approx. 50,000 Daltons |
Nominal Pore Size | 0.03 μm |
Fiber Inner/Outer Diameter | 0.5 mm / 1.3 mm |
Operating Pressure Range | 0.1 – 0.4 MPa |
Operating Temperature Range | 5 – 45°C |
pH Tolerance (cleaning range) | 2 – 10 (up to 11 for short-term cleaning) |
Filtration Mode | Dead-end or Crossflow |
Typical Recovery Rate | 90–98% |
Housing Material (if applicable) | Optional stainless steel or FRP |

This module is constructed for long-term reliability and consistent performance in demanding environments where microscopic purity is non-negotiable.
Application Areas
As a trusted ultrafiltration membrane for electronic grade ultrapure water, the UNA-620A serves a critical function in ensuring process water cleanliness for microelectronics fabrication. It is particularly suitable in scenarios where ultrapure water (UPW) is used in the following processes:
Semiconductor wafer rinsing and cleaning – ensuring particulate-free rinse water.
Photovoltaic cell manufacturing – safeguarding production quality through ultra-low contamination water.
Flat panel display (FPD) production – protecting delicate surfaces during rinse operations.
Pre-RO treatment for high-purity systems – prolonging the life of downstream reverse osmosis membranes.
Final polishing filtration stage in UPW systems – minimizing total organic carbon (TOC) and microbiological activity.
Laboratory-grade ultrapure water preparation – enabling high-precision testing without interference from contaminants.
With the demand for ultrapure water increasing alongside microelectronic technology advancement, UNA-620A provides a cost-effective yet performance-equivalent alternative to established brands such as Asahi Kasei's Microza series, ensuring compatibility and system integration flexibility.
Why Choose UNA-620A?
Functional Compatibility: Seamlessly replaces Asahi Kasei Microza membranes in most existing setups.
Enhanced Membrane Integrity: High mechanical strength ensures consistent filtration over extended operational cycles.
Minimal Fouling Design: Optimized fiber geometry and surface properties reduce fouling and support stable flux rates.
Reduced Operational Downtime: Easy maintenance and durable construction translate to long service life and fewer replacements.
Reliable Quality Assurance: Each membrane module is thoroughly tested to meet industry standards for electronics-grade water purification.
FAQ
Q1: Can the UNA-620A membrane be used in systems previously using Microza membranes without modification?
A1: Yes, the UNA-620A is engineered as a direct equivalent to Asahi Kasei Microza models and fits standard housings with minimal or no system alteration required.
Q2: Is this membrane suitable for ultrapure water used in pharmaceutical or biotechnology industries?
A2: While the UNA-620A is primarily optimized for electronics-grade water, its high separation efficiency and low TOC contribution make it adaptable for other high-purity applications, including pharmaceutical rinse water—subject to validation.