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SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Norit Equivalent
SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Norit Equivalent
SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Norit Equivalent
SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Norit Equivalent
SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Norit Equivalent
SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Norit Equivalent

SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Norit Equivalent

Norit SXL-225FSFCPVC Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent

Product Introduction

LEFILTER proudly introduces the SXL-225FSFCPVC Ultrafiltration Membrane, a high-performance solution specifically engineered for electronic-grade ultrapure water treatment, offering a reliable alternative to Norit’s ultrafiltration technology. Designed to achieve exceptional filtration precision, this membrane stands out in critical applications where ultra-low particulate levels and total organic carbon (TOC) removal are non-negotiable. Thanks to its fine structural integrity and chemically resistant PVC material, the SXL-225FSFCPVC ensures consistent performance in the final polishing stages of ultrapure water production used in semiconductor manufacturing, flat panel displays, and precision electronics.


Technical Specifications

  • Model: SXL-225FSFCPVC

  • Material: Polyvinyl Chloride (PVC) housing + PVDF hollow fiber

  • Membrane Type: Outside-in hollow fiber ultrafiltration

  • Nominal Pore Size: 0.03 μm

  • Effective Membrane Area: Approx. 50 m²

  • Typical Operating Pressure: 0.1 – 0.3 MPa

  • Maximum Operating Pressure: 0.5 MPa

  • Operating Temperature Range: 5°C – 45°C

  • pH Tolerance Range (cleaning): 2 – 10 (short-term up to 11)

  • Flow Capacity: Up to 3.5 m³/h depending on feedwater quality

  • End Connection Type: Standard clamp or customized fitting

  • Dimensions: Diameter 225 mm; Length approx. 1600 mm

  • Membrane Lifespan: 3–5 years under proper operation and maintenance

Ultrafiltration Membrane for Electronic Grade Ultrapure Water 1

This model has been carefully engineered to meet the stringent requirements of electronic-grade processes, ensuring ultra-low TOC levels, exceptional microbial retention, and high throughput—all while offering excellent chemical compatibility with common cleaning agents used in high-purity systems.


Application Fields

The SXL-225FSFCPVC Ultrafiltration Membrane plays a critical role in the production of electronic-grade ultrapure water, particularly in high-tech manufacturing sectors that demand extreme purity levels and unwavering filtration performance. Key industries benefiting from this membrane include:

  • Semiconductor Fabrication: Essential for pre-RO and final polishing stages to ensure water used in wafer cleaning is free from colloids and submicron particles.

  • LCD/LED Panel Manufacturing: Supports defect-free production through ultrapure water with minimal organic and particulate contamination.

  • Photovoltaic Industry: Helps maintain operational stability in sensitive silicon-based solar panel production.

  • Precision Electronics Assembly: Delivers clean water required in microcomponent and sensor manufacturing, where impurity tolerances are close to zero.

  • Pharmaceutical Process Water: Where pre-treatment of high-purity water systems benefits from bacteria and endotoxin retention.

Thanks to its robust configuration and adaptability, the SXL-225FSFCPVC membrane is a dependable asset for industries where water purity is directly linked to product yield, quality, and compliance.


FAQ

Q1: How does this membrane compare to Norit ultrafiltration models in terms of performance?

A1: The SXL-225FSFCPVC is engineered as a Norit equivalent, offering comparable pore size, flow rate, and microbial removal efficiency. It delivers stable performance even under continuous high-demand usage typical in electronics-grade applications.

Q2: Can this membrane be used as a final polishing step after reverse osmosis?

A2: Yes, the membrane is ideal for post-RO polishing, effectively capturing remaining colloids, fine particles, and microorganisms, ensuring water meets ultrapure specifications.

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