Product Introduction
LEFILTER introduces the SXL-225 FSFC Ultrafiltration Membrane, a high-performance solution tailored for applications requiring electronic grade ultrapure water. Designed as a reliable equivalent to Norit’s advanced membrane series, this product showcases outstanding filtration precision and stable flow capacity. It leverages hollow fiber membrane technology to achieve superior particle retention while ensuring excellent operational consistency. With its ability to remove colloids, microorganisms, and ultra-fine particles, the SXL-225 FSFC is ideal for industries where water purity standards are uncompromising—particularly in semiconductor, electronics, and photovoltaic manufacturing sectors.
This ultrafiltration membrane stands out for its robust physical and chemical resistance, long service lifespan, and compatibility with aggressive cleaning procedures, helping reduce downtime and operational costs in critical production lines.
Technical Specifications
Model: SXL-225 FSFC
Membrane Type: Polyvinylidene fluoride (PVDF), hollow fiber
Pore Size: 0.03 μm nominal
Filtration Mode: Outside-in flow
Effective Membrane Area: 50 m²
Operating pH Range: 2–10 (short-term up to 1–12)
Operating Pressure: 0.1–0.3 MPa
Max Transmembrane Pressure: 0.6 MPa
Operating Temperature: 5°C–45°C
Chemical Resistance: Compatible with standard CIP agents including NaOH and HCl
End Connection: ANSI flange or customized design
Outer Shell: High-strength FRP or stainless steel housing available

The SXL-225 FSFC is engineered to deliver a consistent flux rate even under variable feedwater quality, while maintaining reliable separation performance throughout its lifecycle.
Application Fields
The SXL-225 FSFC Ultrafiltration Membrane finds its niche in high-end water purification applications where the control of sub-micron contaminants is critical. Its core application is the pretreatment of ultrapure water systems in sectors such as:
Semiconductor manufacturing – removal of suspended solids and bacteria prior to deionization or RO
Flat panel display (FPD) production – delivering clean process water for sensitive equipment
Photovoltaic (PV) cell fabrication – ensuring particle-free water for wafer cleaning
Laboratory ultrapure water systems – as a polishing stage or microbiological barrier
Pharmaceutical and biotech – where water quality must meet strict microbial limits
With growing demands for water purity in advanced manufacturing environments, the SXL-225 FSFC offers a dependable and scalable solution that meets modern industry standards.
FAQ
Q1: Is the SXL-225 FSFC membrane suitable for integration into existing Norit UF systems?
A1: Yes, the SXL-225 FSFC is designed as a Norit-equivalent module and is compatible with many standard housing and system configurations used in ultrapure water systems.
Q2: How often does this ultrafiltration membrane require chemical cleaning?
A2: Cleaning frequency depends on feedwater quality, but under typical operating conditions, chemical cleaning (CIP) is recommended every 30–90 days to maintain optimal performance.