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Liqui-Flux®W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water 3M™ Equivalent
Liqui-Flux®W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water 3M™ Equivalent
Liqui-Flux®W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water 3M™ Equivalent
Liqui-Flux®W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water 3M™ Equivalent
Liqui-Flux®W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water 3M™ Equivalent
Liqui-Flux®W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water 3M™ Equivalent

Liqui-Flux®W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water 3M™ Equivalent

3M™ Liqui-Flux®W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water Equivalent

LEFILTER is excited to present the Liqui-Flux® W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water, designed as a premium-grade replacement for 3M™’s high-performance UF modules. Tailored to meet the ultra-stringent water quality demands of electronics and semiconductor industries, this membrane provides outstanding filtration efficiency, long-term operational reliability, and compatibility with Liqui-Flux® W-series systems.

Built using high-strength polyethersulfone (PES) hollow fibers, the Liqui-Flux® W10 module features a uniform pore structure and optimized flow design, ensuring exceptional removal of microorganisms, suspended solids, and colloids—while maintaining stable permeability under continuous operation. Whether for new installations or retrofits, this membrane guarantees consistent water purity and reduced system downtime.


Technical Specifications

ParameterSpecification
Membrane TypeInside-Out Hollow Fiber Ultrafiltration
Membrane MaterialPolyethersulfone (PES)
Nominal Pore Size0.03 μm
Effective Membrane Area60 m²
Outer / Inner Fiber Diameter1.3 mm / 0.7 mm
Operating Pressure Range0.1 – 0.4 MPa
Maximum Operating Pressure0.5 MPa
Temperature Range5°C – 45°C
pH Range (Continuous Operation)4 – 10
pH Range (Cleaning – Short-Term)2 – 12
Recovery Efficiency≥ 90%
Backwash CapabilityFully supported
Module HousingHigh-strength ABS / FRP shell

Ultrafiltration Membrane for Electronic Grade Ultrapure Water 1

Thanks to its low fouling tendencies and wide chemical compatibility, the Liqui-Flux® W10 membrane minimizes maintenance efforts while delivering consistently high filtration performance. Its compact modular design also supports flexible system integration and scale-up for industrial-scale UPW systems.


Application Scope

The Liqui-Flux® W10 Ultrafiltration Membrane for Electronic Grade Ultrapure Water is purpose-engineered for high-purity water applications, particularly where ultrapure water quality plays a vital role in maintaining production precision and yield.

It is widely applied in:

  • Semiconductor Wafer Fabrication: As part of the pre-treatment or polishing stage to ensure particle-free and bacteria-free water for sensitive rinsing processes.

  • Display Technology Manufacturing (LCD, OLED): Providing low TOC and ultra-clear water to prevent optical defects in display substrates.

  • Photovoltaic Panel Production: Protecting downstream RO membranes and polishing systems from fouling and organic contamination.

  • Precision Electronics Assembly: Supporting water rinsing systems used in assembling circuit boards and microchips.

  • Laboratory & Cleanroom UPW Systems: Ensuring analytical-grade water quality to prevent interference in sensitive measurements or research outcomes.

With its durable construction and dependable filtration performance, the module meets the operational and quality control needs of high-end electronics industries and ultrapure water treatment providers.


FAQ

Q1: Is the Liqui-Flux® W10 membrane interchangeable with the original 3M™ modules?

A1: Yes. LEFILTER's equivalent module is fully compatible in terms of size, connection type, and performance specifications, making it a convenient plug-and-play replacement in Liqui-Flux® W-series systems.

Q2: What filtration quality can be expected from this UF membrane?

A2: It delivers exceptional removal of fine particulates, colloids, bacteria, and turbidity, with a nominal pore size of 0.03 μm—ensuring stable support for ultrapure water production.

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