Product Overview
LEFILTER proudly presents the HYDRAcap®MAX80 Ultrafiltration Membrane for Electronic Grade Ultrapure Water, a cutting-edge filtration solution engineered for the most sensitive and demanding water treatment environments. Designed as a high-performance equivalent to Hydranautics’ HYDRAcap®MAX series, this membrane module offers exceptional reliability, large membrane area, and ultrafine filtration precision—meeting the purity standards of semiconductor manufacturing, flat panel production, and ultrapure laboratory water systems.
Built with durable PVDF hollow fiber material, the HYDRAcap®MAX80 delivers consistent performance across high-throughput operations. It efficiently removes particles, colloids, bacteria, and high molecular weight organics without compromising flow rate or energy efficiency. Its advanced hydrophilic membrane structure ensures low fouling tendencies and chemical resistance, ideal for maintaining stable water quality in electronics-grade systems.
Technical Specifications
Specification | Details |
---|
Model | HYDRAcap®MAX80 |
Membrane Type | Hollow Fiber, Outside-In Flow |
Membrane Material | Polyvinylidene Fluoride (PVDF) |
Effective Membrane Area | 80 m² |
Nominal Pore Size | 0.03 µm |
Typical Flow Rate | 3.5 – 5.0 m³/h (based on feedwater quality) |
Operating Pressure Range | 1.5 – 6.0 bar |
Maximum Operating Pressure | 6.0 bar |
Operating Temperature | 5 – 45°C |
pH Range (Operation) | 2 – 10 (cleaning: 1.5 – 12 short-term) |
Recovery Rate | Up to 98% |
Bacteria Removal | ≥ 99.999% |
SDI of Permeate | ≤ 1.0 |
Connections | U-pin / Victaulic / Customizable Ends |
Housing Compatibility | Standard Hydranautics Rack Configurations |

Application Fields
The HYDRAcap®MAX80 membrane is purpose-built for ultra-clean production environments where water purity is a non-negotiable parameter. It plays a crucial role in various ultrapure water (UPW) applications, such as:
Semiconductor & IC Manufacturing:
Delivers ultrapure rinse water with minimal organic and particulate contamination, critical for wafer processing, etching, and cleaning steps in front-end and back-end semiconductor fabrication.
Flat Panel Display (FPD) & OLED Production:
Provides highly filtered water used in cleaning delicate display substrates, supporting consistent pixel quality and defect-free output.
Photovoltaic (Solar Cell) Fabrication:
Used in panel washing and cell texturing stages to eliminate microcontaminants, improving energy efficiency and panel yield.
Laboratory & Analytical Facilities:
Integrated into polishing loops and point-of-use filtration systems for mass spectrometry, chromatography, and microanalysis that demand low TOC and high resistivity water.
Advanced Resin Protection Systems:
Acts as a protective barrier before mixed-bed DI units, preventing fouling and extending resin life in critical systems.
For operations requiring uncompromising ultrapure water quality, the LEFILTER HYDRAcap®MAX80 Ultrafiltration Membrane offers a trusted, high-capacity solution. Its advanced performance, operational resilience, and compatibility with industry-standard systems make it an ideal choice for next-generation electronics and high-tech water treatment systems.
FAQ
Q1: How is the HYDRAcap®MAX80 different from other UF membranes in ultrapure applications?
A1: The HYDRAcap®MAX80 offers a higher membrane surface area (80 m²), delivering greater flux and operational efficiency while maintaining high removal rates for microorganisms and particulates. It also supports higher recovery rates and longer cleaning intervals.
Q2: What cleaning process is recommended to maintain long-term membrane performance?
A2: Regular automatic backflushing and periodic chemical cleaning (CIP) using pH-adjusted solutions help maintain optimal flow and prevent fouling. Cleaning intervals typically range from every 30 days to 60 days depending on water quality.