​HYDRAcap80 Ultrafiltration Membrane for Electronic Grade Ultrapure Water Hydranautics Equivalent

Product Introduction

LEFILTER is proud to introduce the HYDRAcap80 Ultrafiltration Membrane for Electronic Grade Ultrapure Water, a high-performance hollow fiber membrane module engineered to meet the demanding water purity requirements of the semiconductor and electronics manufacturing industry. As a high-end equivalent to Hydranautics’ HYDRAcap series, this ultrafiltration solution utilizes advanced capillary PVDF membrane technology that ensures precise separation of colloids, bacteria, and high molecular weight organics—delivering consistently ultrapure water suitable for critical rinsing, cleaning, and microfabrication processes.

Constructed with durability and consistency in mind, the HYDRAcap80 module features an inside-out flow configuration that provides excellent fouling resistance and high flux stability, even under variable water conditions. With its compact design and superior material integrity, this membrane supports long-term operation while minimizing maintenance cycles, making it a cost-effective solution for industrial ultrapure water systems.

Technical Specifications

• Model: HYDRAcap80 Equivalent

• Membrane Type: Hollow fiber, capillary

• Material: Polyvinylidene fluoride (PVDF)

• Nominal Pore Size: 0.03 μm

• Filtration Mode: Inside-out flow

• Membrane Surface Area: 80 m²

• Operating Pressure Range: 1.5–6 bar

• Operating Temperature: 5°C to 45°C

• pH Range (Cleaning): 2–10 (short-term: 1–12)

• Backwash Frequency: Typically every 30–60 minutes

• Design Capacity: Approx. 4.5–6.0 m³/h (depending on feedwater conditions)

These specifications position the HYDRAcap80 as a robust, scalable, and energy-efficient solution, particularly effective in pretreatment steps for ultrapure water generation or as a polishing unit downstream of other filtration technologies.

Application Areas

The HYDRAcap80 Ultrafiltration Membrane is designed for environments where water purity is non-negotiable and stringent contamination control is essential. Common application areas include:

• Semiconductor manufacturing: Final rinse and wet bench cleaning require ultralow total organic carbon (TOC) and particulate-free water. The HYDRAcap80 ensures stable water quality in CMP (Chemical Mechanical Planarization), photolithography, and wafer rinsing.

• Flat panel display (FPD) production: Offers reliable protection against particulate and microbial contamination in screen washing and substrate cleaning.

• Solar cell fabrication: Used in removing organic residues and ions during panel washing, improving overall cell performance.

• Pharmaceutical & microelectronics: Ideal as a pretreatment step before reverse osmosis (RO) or mixed-bed deionization in ultrapure water loops.

• Tool-specific UPW polishing: Can be integrated in point-of-use (POU) systems requiring nanometer-scale cleanliness.

FAQ

Q1: Is the HYDRAcap80 suitable for replacing existing Hydranautics modules in UPW systems?

A1: Yes, LEFILTER's HYDRAcap80 equivalent is engineered to be dimensionally and functionally compatible with Hydranautics modules, allowing for seamless replacement without requiring major system modifications.

Q2: How often does the membrane need to be cleaned or backwashed?

A2: Under standard operating conditions, a backwash cycle is recommended every 30–60 minutes, and chemical cleaning can be performed periodically based on feedwater quality and performance drop—typically every 1–2 months.