Product Introduction
LEFILTER is pleased to present the HYDRAcap40 Ultrafiltration Membrane for Electronic Grade Ultrapure Water, an advanced filtration solution engineered as a reliable equivalent to the Hydranautics HYDRAcap® series. Specifically tailored for the ultrapure water (UPW) requirements of microelectronics, semiconductor fabrication, and high-precision manufacturing, this ultrafiltration membrane delivers exceptional contaminant removal with consistent operational stability.
Utilizing state-of-the-art capillary hollow fiber technology and a hydrophilic polyethersulfone (PES) membrane structure, HYDRAcap40 ensures efficient separation of suspended solids, colloidal particles, and microorganisms — all while maintaining a high flow rate and a compact design. This membrane is particularly suited for polishing applications where resistivity, total organic carbon (TOC), and microbial control are paramount. The HYDRAcap40 model integrates seamlessly into new and existing UPW systems, offering dependable performance and long service life with minimal chemical usage.
Technical Specifications
Parameter | Value |
---|
Model | HYDRAcap40 |
Membrane Material | Polyethersulfone (PES) |
Structure | Hollow Fiber, Outside-In |
Effective Membrane Area | 37–40 m² (approximate, based on configuration) |
Nominal Pore Size | 0.03 µm |
Operating Pressure Range | 0.1 – 0.3 MPa |
Maximum Pressure Limit | 0.6 MPa |
Operating Temperature Range | 5 – 45°C |
Backwash Pressure | ≤ 0.3 MPa |
Continuous pH Range | 3 – 10 |
Chemical Cleaning pH Range | 2 – 12 (short-term: 1–13) |
Bacteria Removal Efficiency | ≥ 99.999% |
SDI of Filtrate | ≤ 1.0 |
Housing Compatibility | PVC / ABS / Stainless Steel (customizable) |
Mounting Configuration | Vertical or horizontal |

The PES membrane offers excellent chemical tolerance and mechanical durability, ensuring stable and long-lasting performance even in high-demand applications.
Application Fields
The HYDRAcap40 Ultrafiltration Membrane is specially developed for industries where ultrapure water quality is essential to ensuring product reliability and process consistency. Key areas of use include:
Semiconductor Fabrication Plants: Delivers particle-free and bacteria-free water during critical cleaning and photolithographic steps, minimizing defects and enhancing production yield.
Flat Panel Display (FPD) and OLED Manufacturing: Used in rinse and process water loops to eliminate fine particulate contamination and preserve optical clarity.
Solar PV Module Production: Maintains water purity during silicon wafer texturing and cleaning phases, supporting energy-efficient photovoltaic performance.
Hard Drive and Microelectronics Assembly: Ensures pure water conditions for coating, polishing, and disk treatment procedures.
Analytical Laboratories & R&D Facilities: Provides stable, low-TOC ultrapure water for high-sensitivity experiments and instrument calibration.
Whether installed in new UPW facilities or used as an upgrade to legacy systems, HYDRAcap40 enhances operational control over water purity metrics such as TOC, conductivity, and microbiological presence.
FAQ
Q1: What advantages does the HYDRAcap40 offer for electronic-grade ultrapure water systems?
A1: HYDRAcap40 offers high-efficiency removal of submicron particles and microorganisms with low chemical requirements, making it ideal for applications demanding consistent water resistivity and low TOC levels.
Q2: How frequently does the membrane require maintenance?
A2: Under standard conditions, automatic backwash is performed daily, and chemical cleaning (CIP) is recommended every 2–4 weeks based on feedwater quality and system operation.