HYDRAcap60 Ultrafiltration Membrane for Semiconductors Ultrapure Water Hydranautics Equivalent

Product Introduction

LEFILTER's HYDRAcap60 Ultrafiltration Membrane is a precision-engineered filtration module tailored for the production of ultrapure water (UPW) in the semiconductor industry. Developed as a performance-equivalent alternative to Hydranautics’ original HYDRAcap60 design, this membrane delivers exceptional particle retention and consistent water purity critical for advanced chip manufacturing.

In semiconductor fabrication processes—especially in front-end-of-line (FEOL) and back-end-of-line (BEOL) steps—water with ultra-low levels of total organic carbon (TOC), bacteria, particles, and pyrogens is essential. This ultrafiltration module ensures effective removal of colloidal contaminants down to sub-0.05 µm, without compromising flow rate or system efficiency.

Its high surface area, compact form factor, and strong chemical tolerance make it ideal for use in UPW polishing systems, final filtration stages, and as a protective barrier before high-sensitivity tools and wet benches.

Product Specifications

The module's uniform pore distribution and ultra-clean construction reduce particle shedding and ensure compatibility with the stringent purity demands of semiconductor water treatment systems.

Application Areas

LEFILTER's HYDRAcap60 equivalent UF membrane is designed to meet the rigorous standards of ultrapure water systems used in electronics and semiconductor manufacturing. Its advanced separation capability makes it suitable for:

-Final Barrier Filtration in UPW Systems: Protects polishing loops and distribution piping from microbial and particulate contamination.

-Tool-Side Water Supply: Ensures contaminant-free water for photolithography, etching, cleaning, and CMP processes.

-Wet Process Equipment Feed: Maintains particle-free conditions in immersion and batch-type wet benches.

-UPW Make-up Water Polishing: Enhances the quality of RO or ion-exchange treated water by removing residual colloids.

-Wafer Rinse & Cleaning Stages: Guarantees ultra-low particle count and bacteria-free water, reducing defect rates.

This module integrates seamlessly into existing systems and supports high-throughput UPW production while meeting or exceeding semiconductor industry standards such as SEMI F63 and ASTM D5127.

FAQ:

Q: Is the HYDRAcap60 equivalent compatible with ozone and hydrogen peroxide cleaning?

A: Yes, the PVDF membrane has excellent oxidative resistance, making it compatible with most standard semiconductor-grade sanitization protocols.

Q: What makes this membrane suitable for final filtration in semiconductor applications?

A: Its fine pore structure, minimal extractables, and low TOC contribution make it ideal for protecting downstream components in the UPW loop.